- Patent Title: Polymer for preparing resist underlayer film, resist underlayer film composition containing the polymer and method for forming resist underlayer film using the composition
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Application No.: US15133808Application Date: 2016-04-20
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Publication No.: US09695279B2Publication Date: 2017-07-04
- Inventor: Kwang Kuk Lee , Jin Su Ham , Sun Joo Kim , Hye Ryoung Lee , Min Ho Jung
- Applicant: SK Innovation Co., Ltd. , SK Global Chemical Co., Ltd.
- Applicant Address: KR Seoul KR Seoul
- Assignee: SK Innovation Co., Ltd.,SK Global Chemical Co., Ltd.
- Current Assignee: SK Innovation Co., Ltd.,SK Global Chemical Co., Ltd.
- Current Assignee Address: KR Seoul KR Seoul
- Agency: The Webb Law Firm
- Priority: KR10-2015-0056831 20150422
- Main IPC: C08G65/38
- IPC: C08G65/38 ; C07C323/18 ; C07C39/17 ; C07C39/42 ; C07C43/225 ; C07C43/23 ; C09D171/00 ; G03F7/11 ; H01L21/027 ; G03F7/09
Abstract:
Provided are a fluoreneol-based monomer, a polymer for preparing a resist underlayer film obtained therefrom, a resist underlayer film composition containing the polymer, and a method for forming a resist underlayer film using the resist underlayer film composition, wherein the fluoreneol-based monomer is represented by Chemical Formula 2 below:
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