Invention Grant
- Patent Title: Method of fabricating rare-earth doped piezoelectric material with various amounts of dopants and a selected C-axis orientation
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Application No.: US14161564Application Date: 2014-01-22
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Publication No.: US09679765B2Publication Date: 2017-06-13
- Inventor: John D. Larson, III , Jyrki Kaitila , Stefan Bader
- Applicant: Avago Technologies General IP (Singapore) Pte. Ltd.
- Applicant Address: SG Singapore
- Assignee: Avago Technologies General IP (Singapore) Pte. Ltd.
- Current Assignee: Avago Technologies General IP (Singapore) Pte. Ltd.
- Current Assignee Address: SG Singapore
- Main IPC: H01L21/02
- IPC: H01L21/02 ; C23C14/06 ; H03H3/02 ; H03H9/02 ; H03H9/58 ; C23C14/02 ; C23C14/34 ; H03H9/17

Abstract:
A method of fabricating a rare-earth element doped piezoelectric material having a first component, a second component and the rare-earth element. The method includes: providing a substrate; initially flowing hydrogen over the substrate; after the initially flowing of the hydrogen over the substrate, flowing the first component to form the rare-earth element doped piezoelectric material over a surface of a target, the target comprising the rare-earth metal in a certain atomic percentage; and sputtering the rare-earth element doped piezoelectric material from the target on the substrate.
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