Invention Grant
- Patent Title: Terminations
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Application No.: US14922708Application Date: 2015-10-26
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Publication No.: US09673063B2Publication Date: 2017-06-06
- Inventor: Dror Hurwitz , Alex Huang
- Applicant: Zhuhai Advanced Chip Carriers & Electronic Substrate Solutions Technologies Co. Ltd.
- Applicant Address: CN Zhuhai
- Assignee: Zhuhai Advanced Chip Carriers & Electronic Substrate Solutions Technologies Co. Ltd.
- Current Assignee: Zhuhai Advanced Chip Carriers & Electronic Substrate Solutions Technologies Co. Ltd.
- Current Assignee Address: CN Zhuhai
- Agency: Wiggin and Dana LLP
- Agent Gregory S. Rosenblatt
- Main IPC: H01L23/48
- IPC: H01L23/48 ; H01L21/48 ; H01L23/498 ; H01L21/60

Abstract:
An electronic support structure comprising one or more layers of copper features such as copper routing layers, laminated within a dielectric material comprising continuous glass fibers in a polymer matrix wherein pairs of adjacent layers of copper features are coupled by a via layer, and where terminations on at least one side of the electronic support structure comprise a modified bond-on-trace attachment sites comprising selectively exposed top and partial side surfaces of copper features in an outer layer of copper features for conductive coupling solder.
Public/Granted literature
- US20170117161A1 NOVEL TERMINATIONS Public/Granted day:2017-04-27
Information query
IPC分类: