Invention Grant
- Patent Title: Compound, resin and photoresist composition
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Application No.: US15047894Application Date: 2016-02-19
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Publication No.: US09671692B2Publication Date: 2017-06-06
- Inventor: Tatsuro Masuyama , Satoshi Yamaguchi , Koji Ichikawa
- Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2015-034214 20150224
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/039 ; G03F7/30 ; G03F7/32 ; G03F7/38 ; C08F220/68 ; C07C69/757 ; C07C69/653 ; C07C69/753

Abstract:
A compound represented by formula (I): wherein R1 represents a hydrogen atom, a halogen atom or a C1-C6 alkyl group where a hydrogen atom can be replaced by a halogen atom, L1 represents a C1-C8 fluorinated alkanediyl group, X1 represents *—CO—O—, *—O—CO—, *—O—CO—O— or *—O— where * represents a binding site to L1, and R2 represents a C1-C18 hydrocarbon group in which a methylene group can be replaced by an oxygen atom, a carbonyl group or a sulfonyl group and in which a hydrogen atom can be replaced by a hydroxy group, or in which two hydrogen atoms can be each replaced by an oxygen atom forming one ketal structure together with a C1-C8 alkanediyl group bonded to the oxygen atom and a hydrogen atom in said ketal structure can be replaced by a fluorine atom.
Public/Granted literature
- US20160244400A1 COMPOUND, RESIN AND PHOTORESIST COMPOSITION Public/Granted day:2016-08-25
Information query
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