- Patent Title: Resin, resist composition and method for producing resist pattern
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Application No.: US14854902Application Date: 2015-09-15
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Publication No.: US09671691B2Publication Date: 2017-06-06
- Inventor: Masahiko Shimada , Yuki Suzuki , Koji Ichikawa
- Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2014-187602 20140916
- Main IPC: C08F220/22
- IPC: C08F220/22 ; G03F7/038 ; G03F7/16 ; G03F7/20 ; G03F7/38 ; G03F7/004 ; G03F7/32 ; G03F7/039 ; C08F14/18 ; G03F7/032 ; C08F224/00
Abstract:
A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), a structural unit having a cyclic ether, and the resin has no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator: wherein R3 represents a hydrogen atom or a methyl group, and R4 represents a C1 to C24 saturated hydrocarbon group having a fluorine atom and a methylene group contained in the saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group.
Public/Granted literature
- US20160075806A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN Public/Granted day:2016-03-17
Information query
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