Invention Grant
- Patent Title: Paste for preparing mask patterns and manufacturing method of solar cell using the same
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Application No.: US13501686Application Date: 2010-10-12
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Publication No.: US09660128B2Publication Date: 2017-05-23
- Inventor: Min-Seo Kim
- Applicant: Min-Seo Kim
- Applicant Address: KR Seoul
- Assignee: LG CHEM, LTD.
- Current Assignee: LG CHEM, LTD.
- Current Assignee Address: KR Seoul
- Agency: Dentons US LLP
- Priority: KR10-2009-0097297 20091013
- International Application: PCT/KR2010/006970 WO 20101012
- International Announcement: WO2011/046347 WO 20110421
- Main IPC: H01L31/18
- IPC: H01L31/18

Abstract:
Provided are a paste for preparing etching mask patterns and a manufacturing method of a silicon solar cell using the same. The paste composition for preparing mask patterns is used to form a selective emitter of a silicon solar cell, and includes inorganic powder, an organic solvent, a binder resin, and a plasticizer. The mask patterns prepared from the paste composition have good adhesion with a substrate, thereby preventing edge curling, and have good etching resistant characteristic in an etch-back process for forming a selective emitter, enabling formation of a stable emitter.
Public/Granted literature
- US20130034928A1 PASTE FOR PREPARING MASK PATTERNS AND MANUFACTURING METHOD OF SOLAR CELL USING THE SAME Public/Granted day:2013-02-07
Information query
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