• Patent Title: Paste for preparing mask patterns and manufacturing method of solar cell using the same
  • Application No.: US13501686
    Application Date: 2010-10-12
  • Publication No.: US09660128B2
    Publication Date: 2017-05-23
  • Inventor: Min-Seo Kim
  • Applicant: Min-Seo Kim
  • Applicant Address: KR Seoul
  • Assignee: LG CHEM, LTD.
  • Current Assignee: LG CHEM, LTD.
  • Current Assignee Address: KR Seoul
  • Agency: Dentons US LLP
  • Priority: KR10-2009-0097297 20091013
  • International Application: PCT/KR2010/006970 WO 20101012
  • International Announcement: WO2011/046347 WO 20110421
  • Main IPC: H01L31/18
  • IPC: H01L31/18
Paste for preparing mask patterns and manufacturing method of solar cell using the same
Abstract:
Provided are a paste for preparing etching mask patterns and a manufacturing method of a silicon solar cell using the same. The paste composition for preparing mask patterns is used to form a selective emitter of a silicon solar cell, and includes inorganic powder, an organic solvent, a binder resin, and a plasticizer. The mask patterns prepared from the paste composition have good adhesion with a substrate, thereby preventing edge curling, and have good etching resistant characteristic in an etch-back process for forming a selective emitter, enabling formation of a stable emitter.
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