Invention Grant
- Patent Title: Multilayer wiring board and method for manufacturing same
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Application No.: US15027784Application Date: 2014-09-24
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Publication No.: US09648759B2Publication Date: 2017-05-09
- Inventor: Nobuyuki Yoshida
- Applicant: HITACHI CHEMICAL COMPANY, LTD.
- Applicant Address: JP Tokyo
- Assignee: HITACHI CHEMICAL COMPANY, LTD.
- Current Assignee: HITACHI CHEMICAL COMPANY, LTD.
- Current Assignee Address: JP Tokyo
- Agency: Fitch Even Tabin & Flannery, LLP
- Priority: JP2013-211871 20131009; JP2014-147754 20140718; JP2014-147755 20140718
- International Application: PCT/JP2014/075255 WO 20140924
- International Announcement: WO2015/053082 WO 20150416
- Main IPC: H05K1/09
- IPC: H05K1/09 ; H05K3/46 ; H05K3/42 ; H05K3/00

Abstract:
The present invention is a multilayer wiring board and a method for manufacturing the same, the multilayer wiring board having a hole for interlayer connection penetrating a metal foil and an insulating layer; an overhang of the metal foil formed at an opening of the hole; lower space formed between the overhang and an inside wall of the hole; and interlayer connection in which the hole is filled with electrolytic filling plating layers, wherein the electrolytic filling plating layers are formed as at least two or more layers, the lower space is filled with any electrolytic filling plating layer except for an outermost layer of the two or more layers of electrolytic filling plating layers, and a diameter in the inside of the interlayer connection formed by any electrolytic filling plating layer except for an outermost layer is equal to or larger than a diameter of the opening.
Public/Granted literature
- US20160242278A1 MULTILAYER WIRING BOARD AND METHOD FOR MANUFACTURING SAME Public/Granted day:2016-08-18
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