Invention Grant
- Patent Title: Applying apparatus
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Application No.: US14819979Application Date: 2015-08-06
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Publication No.: US09648756B2Publication Date: 2017-05-09
- Inventor: Tomohiro Yamakawa
- Applicant: FUJITSU TEN LIMITED
- Applicant Address: JP Kobe-shi
- Assignee: FUJITSU TEN LIMITED
- Current Assignee: FUJITSU TEN LIMITED
- Current Assignee Address: JP Kobe-shi
- Agency: Oliff PLC
- Priority: JP2014-174967 20140829
- Main IPC: B41F15/40
- IPC: B41F15/40 ; B05B9/04 ; A47L9/20 ; H05K3/34 ; H05K13/04 ; B23K3/08 ; B23K1/00 ; B23K1/008 ; B23K1/20 ; B23K101/42

Abstract:
An applying apparatus that applies a flux liquid includes: a nozzle from which the flux liquid is injected; and an intake and exhaust unit that sucks the flux liquid injected from the nozzle through an intake port and exhausts a gas through an exhaust port. The intake and exhaust unit has a filtering unit that filters the flux liquid sucked through the intake port and through which the gas passes before the gas reaches the exhaust port. The filtering unit is movably provided within the intake and exhaust unit so that when installing/removing the filtering unit with respect to the intake and exhaust unit, the filtering unit moves in a direction substantially parallel to a direction in which the flux liquid is sucked through the intake port and in which the gas is exhausted through the exhaust port.
Public/Granted literature
- US20160059170A1 APPLYING APPARATUS Public/Granted day:2016-03-03
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