Invention Grant
- Patent Title: Low voltage embedded memory having conductive oxide and electrode stacks
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Application No.: US14950784Application Date: 2015-11-24
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Publication No.: US09647208B2Publication Date: 2017-05-09
- Inventor: Elijah V. Karpov , Brian S. Doyle , Charles C. Kuo , Robert S. Chau , Eric R. Dickey , Michael Stephen Bowen , Sey-Shing Sun
- Applicant: Elijah V. Karpov , Brian S. Doyle , Charles C. Kuo , Robert S. Chau , Eric R. Dickey , Michael Stephen Bowen , Sey-Shing Sun
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Blakely, Sokoloff, Taylor & Zafman LLP
- Main IPC: G11C11/00
- IPC: G11C11/00 ; H01L45/00 ; G11C13/00 ; H01L27/24

Abstract:
Low voltage embedded memory having conductive oxide and electrode stacks is described. For example, a material layer stack for a memory element includes a first conductive electrode. A conductive oxide layer is disposed on the first conductive electrode. The conductive oxide layer has a plurality of oxygen vacancies therein. A second electrode is disposed on the conductive oxide layer.
Public/Granted literature
- US20160079523A1 LOW VOLTAGE EMBEDDED MEMORY HAVING CONDUCTIVE OXIDE AND ELECTRODE STACKS Public/Granted day:2016-03-17
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