Invention Grant
- Patent Title: Metal oxide semiconductor transistor
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Application No.: US13480742Application Date: 2012-05-25
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Publication No.: US09647138B2Publication Date: 2017-05-09
- Inventor: Chuang-Chuang Tsai , Hsiao-Wen Zan , Hsin-Fei Meng , Chun-Cheng Yeh
- Applicant: Chuang-Chuang Tsai , Hsiao-Wen Zan , Hsin-Fei Meng , Chun-Cheng Yeh
- Applicant Address: TW Hsinchu
- Assignee: E INK HOLDINGS INC.
- Current Assignee: E INK HOLDINGS INC.
- Current Assignee Address: TW Hsinchu
- Agency: WPAT, PC
- Agent Justin King; Douglas A. Hosack
- Priority: TW100120464A 20110610
- Main IPC: H01L29/22
- IPC: H01L29/22 ; H01L51/30 ; H01L29/786

Abstract:
A metal oxide semiconductor transistor includes a gate, a metal oxide active layer, a gate insulating layer, a source, and a drain. The metal oxide active layer has a first surface and a second surface, and the first surface faces to the gate. The gate insulating layer is disposed between the gate and the metal oxide active layer. The source and the drain are respectively connected to the metal oxide active layer. The second surface defines a mobility enhancing region between the source and the drain. An oxygen content of the metal oxide active layer in the mobility enhancing region is less than an oxygen content of the metal oxide active layer in the region outside the mobility enhancing region. The metal oxide semiconductor transistor has high carrier mobility.
Public/Granted literature
- US20120313084A1 METAL OXIDE SEMICONDUCTOR TRANSISTOR Public/Granted day:2012-12-13
Information query
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