Invention Grant
- Patent Title: Field effect transistor
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Application No.: US15065006Application Date: 2016-03-09
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Publication No.: US09647102B2Publication Date: 2017-05-09
- Inventor: Heng-Kuang Lin , Chien-Kai Tung
- Applicant: EPISTAR CORPORATION , HUGA OPTOTECH INC.
- Applicant Address: TW Hsinchu
- Assignee: Epistar Corporation
- Current Assignee: Epistar Corporation
- Current Assignee Address: TW Hsinchu
- Agency: Muncy, Geissler, Olds & Lowe, P.C.
- Priority: TW102109081A 20130314
- Main IPC: H01L29/778
- IPC: H01L29/778 ; H01L29/20 ; H01L29/205 ; H01L29/22 ; H01L29/267

Abstract:
A field effect transistor includes a substrate; a first semiconductor layer, disposed over the substrate; a second semiconductor layer, disposed over the first semiconductor layer, wherein an interface between the first semiconductor layer and the second semiconductor layer has a two-dimensional electron gas; a p+ III-V semiconductor layer, disposed over the second semiconductor layer; and a depolarization layer, disposed between the second semiconductor layer and the p+ III-V semiconductor layer, wherein the depolarization layer includes a metal oxide layer.
Public/Granted literature
- US20160190295A1 FIELD EFFECT TRANSISTOR Public/Granted day:2016-06-30
Information query
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