Image pickup device and method of manufacturing the same
Abstract:
A P-type well is defined by an isolation region formed in a semiconductor substrate. A pixel region and a ground region are defined in the P-type well. In the pixel region, a pixel transistor region and a photodiode region having a photodiode formed therein are defined. An antireflection film is formed so as to cover at least the photodiode region and the ground region. A plug connected to the ground region is formed so as to extend through the antireflection film and the like.
Public/Granted literature
Information query
Patent Agency Ranking
0/0