Invention Grant
- Patent Title: Nonvolatile memory device and method for fabricating the same
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Application No.: US14721970Application Date: 2015-05-26
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Publication No.: US09646977B2Publication Date: 2017-05-09
- Inventor: Sung-Kun Park
- Applicant: SK hynix Inc.
- Applicant Address: KR Icheon
- Assignee: SK HYNIX INC.
- Current Assignee: SK HYNIX INC.
- Current Assignee Address: KR Icheon
- Priority: KR10-2012-00151093 20121221
- Main IPC: H01L27/115
- IPC: H01L27/115 ; H01L21/8247 ; H01L27/11517 ; H01L29/788 ; H01L27/11521 ; H01L27/11541 ; H01L29/423 ; H01L27/11519 ; H01L27/11546 ; H01L27/11558 ; H01L27/092

Abstract:
A nonvolatile memory device includes a floating gate formed over a substrate; a contact plug formed on a first side of the floating gate and disposed parallel to the floating gate with a gap defined therebetween; and a spacer formed on a sidewall of the floating gate and filling the gap, wherein the contact plug and the floating gate have a sufficiently large overlapping area to enable the contact plug to operate as a control gate for the floating gate.
Public/Granted literature
- US20150255472A1 NONVOLATILE MEMORY DEVICE AND METHOD FOR FABRICATING THE SAME Public/Granted day:2015-09-10
Information query
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