Invention Grant
- Patent Title: Method and apparatus for electron beam lithography
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Application No.: US15005348Application Date: 2016-01-25
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Publication No.: US09646802B2Publication Date: 2017-05-09
- Inventor: Yu-Chi Chen
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes & Boone, LLP
- Main IPC: G21K5/00
- IPC: G21K5/00 ; H01J37/147 ; H01J37/317
Abstract:
Disclosed is an apparatus in a semiconductor lithography system. The apparatus comprises a multiplexer and a plurality of imaging elements. The plurality is configured into a shift chain and an output of the shift chain is coupled to a data input of the multiplexer.
Public/Granted literature
- US20160141144A1 Method and Apparatus for Electron Beam Lithography Public/Granted day:2016-05-19
Information query
