Invention Grant
- Patent Title: Composite electronic structure with partially exposed and protruding copper termination posts
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Application No.: US14163084Application Date: 2014-01-24
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Publication No.: US09642261B2Publication Date: 2017-05-02
- Inventor: Dror Hurwitz , Alex Huang
- Applicant: Zhuhai Advanced Chip Carriers & Electronic Substrate Solutions Technologies Co. Ltd.
- Applicant Address: CN Zhuhai
- Assignee: Zhuhai Advanced Chip Carriers & Electronic Substrate Solutions Technologies Co. Ltd.
- Current Assignee: Zhuhai Advanced Chip Carriers & Electronic Substrate Solutions Technologies Co. Ltd.
- Current Assignee Address: CN Zhuhai
- Agency: Wiggin and Dana LLP
- Agent Gregory S. Rosenblatt; Jonathan D. Hall
- Main IPC: H05K3/40
- IPC: H05K3/40 ; H05K1/02

Abstract:
A multilayer composite electronic structure comprising feature layers extending in an X-Y plane, each adjacent pair of feature layers being separated by an inner via layer, the via layer comprising via posts that couple adjacent feature layers in a Z direction perpendicular to the X-Y plane, the via posts being embedded in an inner layer dielectric, the multilayer composite structure further comprising at least one outer layer of terminations comprising at least one copper post that is only partially embedded in an outer layer of dielectric such that part of the at least one copper post protrudes beyond surface of the outer layer of dielectric.
Public/Granted literature
- US20150214171A1 Substrates with Protruding Copper Termination Posts Public/Granted day:2015-07-30
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