Invention Grant
- Patent Title: Semiconductor device and method of manufacturing semiconductor device
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Application No.: US15116288Application Date: 2014-10-06
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Publication No.: US09640651B2Publication Date: 2017-05-02
- Inventor: Hidefumi Takaya , Jun Saito , Akitaka Soeno , Kimimori Hamada , Shoji Mizuno , Sachiko Aoi , Yukihiko Watanabe
- Applicant: Hidefumi Takaya , Jun Saito , Akitaka Soeno , Kimimori Hamada , Shoji Mizuno , Sachiko Aoi , Yukihiko Watanabe
- Applicant Address: JP Toyota JP Kariya
- Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA,DENSO CORPORATION
- Current Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA,DENSO CORPORATION
- Current Assignee Address: JP Toyota JP Kariya
- Agency: Oliff PLC
- Priority: JP2014-023869 20140210
- International Application: PCT/JP2014/076722 WO 20141006
- International Announcement: WO2015/118721 WO 20150813
- Main IPC: H01L29/94
- IPC: H01L29/94 ; H01L29/78 ; H01L29/06 ; H01L29/66 ; H01L21/761 ; H01L29/16

Abstract:
A semiconductor device includes a termination trench surrounding a region in which a plurality of gate trenches is provided; a p-type lower end region being in contact with a lower end of the termination trench; a p-type outer circumference region being in contact with the termination trench from an outer circumferential side and exposed on a surface of the semiconductor device; a plurality of guard ring regions of a p-type provided on an outer circumferential side of the p-type outer circumference region and exposed on the surface; and an n-type outer circumference region separating the p-type outer circumference region from the guard ring regions and separating the guard ring regions from each another.
Public/Granted literature
- US20170012122A1 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE Public/Granted day:2017-01-12
Information query
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