Invention Grant
- Patent Title: Precursors for CVD silicon carbo-nitride films
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Application No.: US14571943Application Date: 2014-12-16
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Publication No.: US09640386B2Publication Date: 2017-05-02
- Inventor: Manchao Xiao , Arthur Kenneth Hochberg
- Applicant: AIR PRODUCTS AND CHEMICALS, INC.
- Applicant Address: US PA Allentown
- Assignee: VERSUM MATERIALS US, LLC
- Current Assignee: VERSUM MATERIALS US, LLC
- Current Assignee Address: US PA Allentown
- Agent Michael K. Boyer
- Main IPC: C07F7/02
- IPC: C07F7/02 ; H01L21/02 ; C23C16/36 ; C09D5/00

Abstract:
Classes of liquid aminosilanes have been found which allow for the production of silicon carbo-nitride films of the general formula SixCyNz. These aminosilanes, in contrast, to some of the precursors employed heretofore, are liquid at room temperature and pressure allowing for convenient handling. In addition, the invention relates to a process for producing such films.The classes of compounds are generally represented by the formulas: and mixtures thereof, wherein R and R1 in the formulas represent aliphatic groups typically having from 2 to about 10 carbon atoms, e.g., alkyl, cycloalkyl with R and R1 in formula A also being combinable into a cyclic group, and R2 representing a single bond, (CH2)n, a ring, or SiH2.
Public/Granted literature
- US20150147893A1 Precursors for CVD Silicon Carbo-Nitride Films Public/Granted day:2015-05-28
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