Invention Grant
- Patent Title: Laminated polishing pad and method for producing same
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Application No.: US14390959Application Date: 2013-02-28
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Publication No.: US09636796B2Publication Date: 2017-05-02
- Inventor: Kenji Nakamura
- Applicant: TOYO TIRE & RUBBER CO., LTD.
- Applicant Address: US DE Newark
- Assignee: ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC.
- Current Assignee: ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC.
- Current Assignee Address: US DE Newark
- Agency: Law Office of Katsuhiro Arai
- Priority: JP2012-090241 20120411
- International Application: PCT/JP2013/055516 WO 20130228
- International Announcement: WO2013/153875 WO 20131017
- Main IPC: B24B37/005
- IPC: B24B37/005 ; B24B37/22 ; B32B3/10 ; H01L21/306 ; B24B37/20 ; B24B37/013 ; B32B37/18 ; B32B38/10 ; B32B37/12 ; B32B38/00

Abstract:
A method for manufacturing a laminated polishing pad of the present invention, comprising the steps of: forming a polishing layer by providing a light transmitting region in an opening A of a polishing region; providing an adhesive member X on one side of the polishing layer, wherein the adhesive member X contains a hot-melt adhesive; providing a removable protective member on a part of the adhesive member X corresponding to the light transmitting region; bonding a support layer to the adhesive member X on which the removable protective member is provided; and removing a part of the support layer corresponding to the light transmitting region and also removing the removable protective member to form an opening B.
Public/Granted literature
- US20150079879A1 LAMINATED POLISHING PAD AND METHOD FOR PRODUCING SAME Public/Granted day:2015-03-19
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