Invention Grant
- Patent Title: Extreme low frequency acoustic measurement system
- Patent Title (中): 极低频声学测量系统
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Application No.: US13771735Application Date: 2013-02-20
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Publication No.: US09591417B2Publication Date: 2017-03-07
- Inventor: Qamar A. Shams , Allan J. Zuckerwar
- Applicant: The United States of America as represented by the Administrator of the National Aeronautics and Space Administration
- Applicant Address: US DC Washington
- Assignee: THE UNITED STATES OF AMERICA AS REPRESENTED BY THE ADMINISTRATOR OF THE NATIONAL AERONAUTICS AND SPACE ADMINISTRATION
- Current Assignee: THE UNITED STATES OF AMERICA AS REPRESENTED BY THE ADMINISTRATOR OF THE NATIONAL AERONAUTICS AND SPACE ADMINISTRATION
- Current Assignee Address: US DC Washington
- Agent Robin W. Edwards
- Main IPC: H04R29/00
- IPC: H04R29/00 ; G01H11/02 ; H04R19/00
Abstract:
The present invention is an extremely low frequency (ELF) microphone and acoustic measurement system capable of infrasound detection in a portable and easily deployable form factor. In one embodiment of the invention, an extremely low frequency electret microphone comprises a membrane, a backplate, and a backchamber. The backchamber is sealed to allow substantially no air exchange between the backchamber and outside the microphone. Compliance of the membrane may be less than ambient air compliance. The backplate may define a plurality of holes and a slot may be defined between an outer diameter of the backplate and an inner wall of the microphone. The locations and sizes of the holes, the size of the slot, and the volume of the backchamber may be selected such that membrane motion is substantially critically damped.
Public/Granted literature
- US20150264498A1 Extreme Low Frequency Acoustic Measurement System Public/Granted day:2015-09-17
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