Invention Grant
- Patent Title: Laser processing of superconductor layers
- Patent Title (中): 超导体层的激光加工
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Application No.: US14092296Application Date: 2013-11-27
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Publication No.: US09590161B2Publication Date: 2017-03-07
- Inventor: Connie P. Wang , Paul Murphy , Paul Sullivan , Sukti Chatterjee
- Applicant: Varian Semiconductor Equipment Associates, Inc.
- Applicant Address: US MA Gloucester
- Assignee: Varian Semiconductor Equipment Associates, Inc.
- Current Assignee: Varian Semiconductor Equipment Associates, Inc.
- Current Assignee Address: US MA Gloucester
- Main IPC: H01L39/24
- IPC: H01L39/24 ; H01L39/12
Abstract:
A method of forming a superconductor includes exposing a layer disposed on a substrate to an oxygen ambient, and selectively annealing a portion of the layer to form a superconducting region within the layer.
Public/Granted literature
- US20150148236A1 LASER PROCESSING OF SUPERCONDUCTOR LAYERS Public/Granted day:2015-05-28
Information query
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