Invention Grant
- Patent Title: High-voltage transistor having shielding gate
- Patent Title (中): 具有屏蔽门的高电压晶体管
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Application No.: US14150366Application Date: 2014-01-08
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Publication No.: US09590052B2Publication Date: 2017-03-07
- Inventor: Hiroyuki Kutsukake , Kikuko Sugimae , Takeshi Kamigaichi
- Applicant: KABUSHIKI KAISHA TOSHIBA
- Applicant Address: JP Minato-ku
- Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2004-239593 20040819
- Main IPC: H01L29/40
- IPC: H01L29/40 ; H01L27/115 ; H01L27/105 ; H01L27/112

Abstract:
A semiconductor device includes a plurality of high-voltage insulated-gate field-effect transistors arranged in a matrix form on the main surface of a semiconductor substrate and each having a gate electrode, a gate electrode contact formed on the gate electrode, and a wiring layer which is formed on the gate electrode contacts adjacent in a gate-width direction to electrically connect the gate electrodes arranged in the gate-width direction. And the device includes shielding gates provided on portions of an element isolation region which lie between the transistors adjacent in the gate-width direction and gate-length direction and used to apply reference potential or potential of a polarity different from that of potential applied to the gate of the transistor to turn on the current path of the transistor to the element isolation region.
Public/Granted literature
- US20140117458A1 HIGH-VOLTAGE TRANSISTOR HAVING SHIELDING GATE Public/Granted day:2014-05-01
Information query
IPC分类: