Invention Grant
US09589884B2 Integrated circuit device with radio frequency (RF) switches and controller
有权
具有射频(RF)开关和控制器的集成电路器件
- Patent Title: Integrated circuit device with radio frequency (RF) switches and controller
- Patent Title (中): 具有射频(RF)开关和控制器的集成电路器件
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Application No.: US14572462Application Date: 2014-12-16
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Publication No.: US09589884B2Publication Date: 2017-03-07
- Inventor: Herb He Huang , Clifford Ian Drowley
- Applicant: Semiconductor Manufacturing International (Shanghai) Corporation
- Applicant Address: CN
- Assignee: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION
- Current Assignee: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION
- Current Assignee Address: CN
- Agency: Innovation Counsel LLP
- Priority: CN201410038083 20140126
- Main IPC: H01L21/8244
- IPC: H01L21/8244 ; H01L23/50 ; H01L21/822 ; H01L27/06 ; H01L27/088 ; H01L27/02

Abstract:
An integrated circuit device may include the following elements: a first semiconductor substrate; a first transistor set positioned in the first semiconductor substrate; a first dielectric layer covering a gate electrode of the first transistor set; a first interconnect member positioned in the first dielectric layer and electrically connected to the first transistor set; a second semiconductor substrate; a second transistor set positioned in the second semiconductor substrate and structurally different from the first transistor set; a second dielectric layer connected to the first dielectric layer, positioned between the first dielectric layer and the second semiconductor substrate, and covering a gate electrode of the second transistor set; and a second interconnect member positioned in the second dielectric layer, electrically connected to a terminal of the second transistor set, and electrically connected to the first interconnect member.
Public/Granted literature
- US20150214221A1 INTEGRATED CIRCUIT DEVICE AND RELATED MANUFACTURING METHOD Public/Granted day:2015-07-30
Information query
IPC分类: