Invention Grant
US09589794B2 Hot-wire method for depositing semiconductor material on a substrate and device for performing the method 有权
用于在基板上沉积半导体材料的热丝方法和用于执行该方法的装置

Hot-wire method for depositing semiconductor material on a substrate and device for performing the method
Abstract:
A hot wire device and method for depositing semiconductor material onto a substrate in a deposition chamber in which the ends of at least two filaments are clamped into a filament holder and heated by supplying current, wherein a voltage for generating an electrical current is applied in temporal succession to filaments made of differing materials so that a number of differing semiconductors corresponding to the number of consecutively heated filament materials can be consecutively deposited onto the substrate without opening the chamber.
Information query
Patent Agency Ranking
0/0