Invention Grant
US09589794B2 Hot-wire method for depositing semiconductor material on a substrate and device for performing the method
有权
用于在基板上沉积半导体材料的热丝方法和用于执行该方法的装置
- Patent Title: Hot-wire method for depositing semiconductor material on a substrate and device for performing the method
- Patent Title (中): 用于在基板上沉积半导体材料的热丝方法和用于执行该方法的装置
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Application No.: US14004734Application Date: 2012-03-30
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Publication No.: US09589794B2Publication Date: 2017-03-07
- Inventor: Friedhelm Finger , Andreas Schmalen , Johannes Wolff
- Applicant: Friedhelm Finger , Andreas Schmalen , Johannes Wolff
- Applicant Address: DE Juelich
- Assignee: Forschungszentrum Juelich GmbH
- Current Assignee: Forschungszentrum Juelich GmbH
- Current Assignee Address: DE Juelich
- Agency: Jordan and Koda, PLLC
- Priority: DE102011018324 20110420
- International Application: PCT/DE2012/000346 WO 20120330
- International Announcement: WO2012/142992 WO 20121026
- Main IPC: C23C16/00
- IPC: C23C16/00 ; H01L21/02 ; C30B25/02 ; C23C16/24 ; C23C16/32 ; C23C16/448

Abstract:
A hot wire device and method for depositing semiconductor material onto a substrate in a deposition chamber in which the ends of at least two filaments are clamped into a filament holder and heated by supplying current, wherein a voltage for generating an electrical current is applied in temporal succession to filaments made of differing materials so that a number of differing semiconductors corresponding to the number of consecutively heated filament materials can be consecutively deposited onto the substrate without opening the chamber.
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