Invention Grant
US09589788B2 Polymer with a good heat resistance and storage stability, underlayer film composition containing the polymer and process for forming underlayer film using the composition
有权
具有良好的耐热性和储存稳定性的聚合物，含有聚合物的下层膜组合物和使用该组合物形成下层膜的方法
- Patent Title: Polymer with a good heat resistance and storage stability, underlayer film composition containing the polymer and process for forming underlayer film using the composition
- Patent Title (中): 具有良好的耐热性和储存稳定性的聚合物，含有聚合物的下层膜组合物和使用该组合物形成下层膜的方法
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Application No.: US15178597Application Date: 2016-06-10
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Publication No.: US09589788B2Publication Date: 2017-03-07
- Inventor: Min Ho Jung , Jeong Eop Choi , Hye Ryoung Lee
- Applicant: SK Innovation Co., Ltd. , SK Global Chemical Co., Ltd.
- Applicant Address: KR Seoul KR Seoul
- Assignee: SK Innovation Co., Ltd.,SK Global Chemical Co., Ltd.
- Current Assignee: SK Innovation Co., Ltd.,SK Global Chemical Co., Ltd.
- Current Assignee Address: KR Seoul KR Seoul
- Agency: The Webb Law Firm
- Priority: KR10-2015-0082470 20150611; KR10-2016-0063864 20160525
- Main IPC: H01L21/31
- IPC: H01L21/31 ; H01L21/02 ; C08G8/02 ; C09D161/16 ; H01L21/027 ; G03F7/11 ; C08K5/3445
Abstract:
Provided are a polymer for an underlayer film, used in semiconductor and display manufacturing processes, an underlayer film composition for semiconductor and display manufacturing processes, containing the same, and a method for forming an underlayer film for semiconductor and display manufacturing processes using the underlayer film composition. The polymer according to the present invention is a polymer including a repeating unit represented by the following Chemical Formula 1: in Chemical Formula 1, Ar, R1 to R6, L, and R′ and R″ are the same as those in the detailed description of the present invention.
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