Invention Grant
- Patent Title: Exposure apparatus, exposure method, and device producing method
- Patent Title (中): 曝光装置，曝光方法和装置制造方法
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Application No.: US13317170Application Date: 2011-10-12
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Publication No.: US09588436B2Publication Date: 2017-03-07
- Inventor: Hiroyuki Nagasaka
- Applicant: Hiroyuki Nagasaka
- Applicant Address: JP Tokyo
- Assignee: NIKON CORPORATION
- Current Assignee: NIKON CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2004-000236 20040105
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03F7/20
Abstract:
An exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) on the substrate (P) via a projection optical system (PL) and a liquid (LQ) supplied from a liquid supply mechanism (10). The exposure apparatus (EX) has a pressure adjustment mechanism (90) for adjusting pressure of the liquid (LQ) supplied from the liquid supply mechanism (10). A liquid immersion area is satisfactorily formed to obtain high exposure accuracy and measurement accuracy.
Public/Granted literature
- US20120033192A1 Exposure apparatus, exposure method, and device producing method Public/Granted day:2012-02-09
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