Invention Grant
US09588416B2 Methods and apparatus for nanofabrication using a pliable membrane mask
有权
使用柔韧膜掩膜进行纳米制造的方法和装置
- Patent Title: Methods and apparatus for nanofabrication using a pliable membrane mask
- Patent Title (中): 使用柔韧膜掩膜进行纳米制造的方法和装置
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Application No.: US14537304Application Date: 2014-11-10
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Publication No.: US09588416B2Publication Date: 2017-03-07
- Inventor: Dirk Robert Englund , Igal Bayn , Luozhou Li
- Applicant: Dirk Robert Englund , Igal Bayn , Luozhou Li
- Applicant Address: US NY New York
- Assignee: Columbia University
- Current Assignee: Columbia University
- Current Assignee Address: US NY New York
- Agency: Cooley LLP
- Main IPC: G03F1/62
- IPC: G03F1/62 ; C09K13/00 ; C23C14/58 ; C01B31/06 ; G01Q80/00 ; C23C16/48 ; C23C16/50 ; H01J37/317

Abstract:
Apparatus for nanofabrication on an unconventional substrate including a patterned pliable membrane mechanically coupled to a membrane support structure, a substrate support structure to receive a substrate for processing, and an actuator to adjust the distance between the pliable membrane and the substrate. Nanofabrication on conventional and unconventional substrates can be achieved by transferring a pre-formed patterned pliable membrane onto the substrate using a transfer probe or non-stick sheet, followed by irradiating the substrate through the patterned pliable membrane so as to transfer the pattern on the pliable membrane into or out of the substrate. The apparatus and methods allow fabrication of diamond photonic crystals, fiber-integrated photonic devices and Nitrogen Vacancy (NV) centers in diamonds.
Public/Granted literature
- US20150378261A1 Methods and Apparatus for Nanofabrication Using a Pliable Membrane Mask Public/Granted day:2015-12-31
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