Invention Grant
US09587789B2 Methods and apparatus for providing a gas mixture to a pair of process chambers
有权
将气体混合物提供给一对处理室的方法和装置
- Patent Title: Methods and apparatus for providing a gas mixture to a pair of process chambers
- Patent Title (中): 将气体混合物提供给一对处理室的方法和装置
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Application No.: US14091942Application Date: 2013-11-27
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Publication No.: US09587789B2Publication Date: 2017-03-07
- Inventor: Jared Ahmad Lee , Martin Jeffrey Salinas , Ezra Robert Gold , James P. Cruse
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Moser Taboada
- Agent Alan Taboada
- Main IPC: B08B3/00
- IPC: B08B3/00 ; F17D3/03 ; H01J37/32 ; H01L21/02 ; H01L21/67

Abstract:
A method and apparatus for supplying a gas mixture to a load lock chamber is described. In one embodiment, the apparatus supplies a gas mixture to a pair of process chambers, comprising a first ozone generator to provide a first gas mixture to a first process chamber, a second ozone generator to provide a second gas mixture to a second process chamber, a first gas source coupled to the first ozone generator via a first mass flow controller and a first gas line, and coupled to the second ozone generator via a second mass flow controller and a second gas line, and a second gas source coupled to the first ozone generator via a third mass flow controller and a third gas line and coupled to the second ozone generator via fourth mass flow controller and a fourth gas line.
Public/Granted literature
- US20140076850A1 METHODS AND APPARATUS FOR PROVIDING A GAS MIXTURE TO A PAIR OF PROCESS CHAMBERS Public/Granted day:2014-03-20
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