Invention Grant
- Patent Title: Semiconductor laser device and manufacturing method thereof
- Patent Title (中): 半导体激光器件及其制造方法
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Application No.: US14932010Application Date: 2015-11-04
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Publication No.: US09564738B2Publication Date: 2017-02-07
- Inventor: Yoshito Nishioka , Yoichi Mugino , Tsuguki Noma
- Applicant: ROHM CO., LTD.
- Applicant Address: JP Kyoto
- Assignee: ROHM CO., LTD.
- Current Assignee: ROHM CO., LTD.
- Current Assignee Address: JP Kyoto
- Agency: Rabin & Berdo, P.C.
- Priority: JP2011-15731 20110127; JP2011-15732 20110127
- Main IPC: H01S5/343
- IPC: H01S5/343 ; B82Y20/00 ; H01S5/34 ; G11B5/00 ; H01S5/16 ; H01S5/22 ; H01S5/32

Abstract:
A semiconductor laser device includes an n-type clad layer, a first p-type clad layer and a ridge stripe. The device also includes an active layer interposed between the n-type clad layer and the first p-type clad layer, and a current-blocking layer formed on side surfaces of the ridge stripe. The ridge stripe of the device includes a second p-type clad layer formed into a ridge stripe shape on the opposite surface of the first p-type clad layer from the n-type clad layer. The ridge stripe is formed such that a first ridge width as the width of a surface of the second p-type clad layer exists on the same side as the first p-type clad layer and a second ridge width as the width of a surface of the second p-type clad layer exists on the opposite side from the first p-type clad layer.
Public/Granted literature
- US20160064902A1 SEMICONDUCTOR LASER DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2016-03-03
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