Invention Grant
US09564323B2 Method of laser irradiation, laser irradiation apparatus, and method of manufacturing a semiconductor device 有权
激光照射方法,激光照射装置以及半导体装置的制造方法

Method of laser irradiation, laser irradiation apparatus, and method of manufacturing a semiconductor device
Abstract:
If an optical path length of an optical system is reduced and a length of a laser light on an irradiation surface is increased, there occurs curvature of field which is a phenomenon that a convergent position deviates depending on an incident angle or incident position of a laser light with respect to a lens. To avoid this phenomenon, an optical element having a negative power such as a concave lens or a concave cylindrical lens is inserted to regulate the optical path length of the laser light and a convergent position is made coincident with a irradiation surface to form an image on the irradiation surface.
Information query
Patent Agency Ranking
0/0