Invention Grant
- Patent Title: Ion beam measuring device and method of measuring ion beam
- Patent Title (中): 离子束测量装置及测量离子束的方法
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Application No.: US14314448Application Date: 2014-06-25
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Publication No.: US09564292B2Publication Date: 2017-02-07
- Inventor: Noriyasu Ido , Kouji Inada , Kazuhiro Watanabe
- Applicant: Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Current Assignee: Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Michael Best & Friedrich LLP
- Main IPC: H01J37/304
- IPC: H01J37/304 ; H01J37/317 ; H01J37/244

Abstract:
An ion beam measuring device includes: a mask that is used for shaping an original ion beam into a measuring ion beam including a y beam part elongated in a y direction that is perpendicular to a traveling direction of the ion beam and an x beam part elongated in an x direction that is perpendicular to the traveling direction and the y direction; a detection unit that is configured to detect an x-direction position of the y beam part and a y-direction position of the x beam part; and a beam angle calculating unit that is configured to calculate an x-direction beam angle using the x-direction position and a y-direction beam angle using the y-direction position.
Public/Granted literature
- US20150001418A1 ION BEAM MEASURING DEVICE AND METHOD OF MEASURING ION BEAM Public/Granted day:2015-01-01
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