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US09564260B2 Method for preparing a silicon dioxide substrate-based graphene transparent conductive film 有权
制备二氧化硅基板的石墨烯透明导电膜的方法

Method for preparing a silicon dioxide substrate-based graphene transparent conductive film
Abstract:
The present invention provides a method for preparing a silicon dioxide substrate-based graphene transparent conductive film, which comprises: preparing a silicon dioxide substrate on a graphene transparent conductive film, thereby obtaining a silicon dioxide substrate-based graphene transparent conductive film. In the method for preparing a silicon dioxide substrate-based graphene transparent conductive film according to the embodiments of the present invention, the silicon dioxide substrate is prepared on the graphene transparent conductive film, and a graphene transferring step that is difficult to implement in the prior art can be avoided, thus the silicon dioxide substrate-based graphene transparent conductive film can be prepared conveniently, and the cost may be reduced at the same time.
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