Invention Grant
- Patent Title: Cell circuit and layout with linear finfet structures
- Patent Title (中): 单元电路和布局与线性finfet结构
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Application No.: US12775429Application Date: 2010-05-06
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Publication No.: US09563733B2Publication Date: 2017-02-07
- Inventor: Scott T. Becker
- Applicant: Scott T. Becker
- Applicant Address: US CA Los Gatos
- Assignee: Tela Innovations, Inc.
- Current Assignee: Tela Innovations, Inc.
- Current Assignee Address: US CA Los Gatos
- Agency: Martine Penilla Group, LLP
- Main IPC: G06F17/50
- IPC: G06F17/50 ; H01L29/76 ; H01L27/092 ; H01L27/088 ; H01L27/02 ; H01L21/302 ; H01L21/84 ; H01L29/78

Abstract:
A cell circuit and corresponding layout is disclosed to include linear-shaped diffusion fins defined to extend over a substrate in a first direction so as to extend parallel to each other. Each of the linear-shaped diffusion fins is defined to project upward from the substrate along their extent in the first direction. A number of gate level structures are defined to extend in a conformal manner over some of the number of linear-shaped diffusion fins. Portions of each gate level structure that extend over any of the linear-shaped diffusion fins extend in a second direction that is substantially perpendicular to the first direction. Portions of each gate level structure that extend over any of the linear-shaped diffusion fins form gate electrodes of a corresponding transistor. The diffusion fins and gate level structures can be placed in accordance with a diffusion fin virtual grate and a gate level virtual grate, respectively.
Public/Granted literature
- US20100287518A1 Cell Circuit and Layout with Linear Finfet Structures Public/Granted day:2010-11-11
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