Invention Grant
- Patent Title: Cell boundaries for self aligned multiple patterning abutments
- Patent Title (中): 自对准多图案化基台的单元边界
-
Application No.: US14210490Application Date: 2014-03-14
-
Publication No.: US09563731B2Publication Date: 2017-02-07
- Inventor: Chin-Hsiung Hsu , Li-Chun Tien , Pin-Dai Sue , Ching Hsiang Chang , Wen-Hao Chen , Cheng-I Huang
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Duane Morris LLP
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G03F7/20 ; G03F1/70

Abstract:
A system and method of determining a cell layout are disclosed. The method includes receiving a circuit design corresponding to a predetermined circuit design, the circuit design having a first set of cells and abutting adjacent cells in the first set of cells, the abutted cells having a first boundary pattern therebetween. The first boundary pattern is exchanged with a second boundary pattern based on a number or positions of signal wires in the first boundary pattern. A cell layout for use in a patterning process can then be determined, the cell layout including the second boundary pattern.
Public/Granted literature
- US20140282289A1 CELL BOUNDARIES FOR SELF ALIGNED MULTIPLE PATTERNING ABUTMENTS Public/Granted day:2014-09-18
Information query