An exposure apparatus includes a projection system; a liquid supply system configured to supply liquid to a space under the projection system; a liquid recovery system configured to recover the supplied liquid via a recovery opening; a separator fluidically connected to the recovery opening, which separates one of the liquid and gas, which has been collected via the recovery opening, from the other; a flow-meter fluidically connected to the recovery opening; a stage system configured to move a movable member on which a substrate is held; and a measurement system having a light receiving part which receives a measurement light through a light-transmissive member provided at the movable member and through the liquid between the projection system and the light-transmissive member.