Invention Grant
- Patent Title: Resist composition and method for producing resist pattern
- Patent Title (中): 抗蚀剂组合物和抗蚀剂图案的制造方法
-
Application No.: US14950212Application Date: 2015-11-24
-
Publication No.: US09563125B2Publication Date: 2017-02-07
- Inventor: Tatsuro Masuyama , Yuichi Mukai , Koji Ichikawa
- Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2014-238551 20141126
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/039 ; G03F7/16 ; G03F7/20 ; G03F7/38 ; G03F7/32 ; C08F232/08 ; H01L21/027 ; C08F220/24 ; C08F220/18 ; C08F220/22
Abstract:
A non-ionic compound includes a group represented by formula (Ia): wherein R2 represents a group having a C5 to C18 alicyclic hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group, Rf1 and Rf2 each independently represent a C1 to C4 perfluoroalkyl group, and * represents a binding site.
Public/Granted literature
- US20160147146A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN Public/Granted day:2016-05-26
Information query
IPC分类:
