Invention Grant
- Patent Title: Electrodeposited copper foil
- Patent Title (中): 电沉积铜箔
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Application No.: US14486107Application Date: 2014-09-15
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Publication No.: US09562298B2Publication Date: 2017-02-07
- Inventor: Jui-Chang Chou , Kuei-Sen Cheng , Yao-Sheng Lai , Hsi-Hsing Lo , Yueh-Min Liu
- Applicant: Chang Chun Petrochemical Co., Ltd.
- Applicant Address: TW Taipei
- Assignee: Chang Chun Petrochemical Co., Ltd.
- Current Assignee: Chang Chun Petrochemical Co., Ltd.
- Current Assignee Address: TW Taipei
- Agency: Polsinelli PC
- Priority: TW103110616A 20140321
- Main IPC: B21C37/00
- IPC: B21C37/00 ; C25D1/04 ; C25D3/38

Abstract:
An electrodeposited copper foil having a texture coefficient of a plane (200) from 50 to 80%, based on the sum of the texture coefficients of a plane (111), the plane (200), a plane (220) and a plane (200) of the electrodeposited copper foil is provided. The electrodeposited copper foil is particularly suitable for use in the applications in printed circuit boards and lithium ion secondary batteries.
Public/Granted literature
- US20150267313A1 ELECTRODEPOSITED COPPER FOIL Public/Granted day:2015-09-24
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