Invention Grant
- Patent Title: Semiconductor device including built-in crack-arresting film structure
- Patent Title (中): 半导体器件包括内置的防裂膜结构
-
Application No.: US14543986Application Date: 2014-11-18
-
Publication No.: US09536853B2Publication Date: 2017-01-03
- Inventor: Wei Lin , Leathen Shi , Spyridon Skordas , Kevin R. Winstel
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee Address: US NY Armonk
- Agency: Cantor Colburn LLP
- Agent Steven Meyers
- Main IPC: H01L23/00
- IPC: H01L23/00 ; H01L33/00

Abstract:
According to at least one embodiment of the present invention, a wafer-to-wafer semiconductor device includes a first wafer substrate having a first bonding layer formed on a first bulk substrate layer. A second wafer substrate includes a second bonding layer formed on a second bulk substrate layer. The second bonding layer is bonded to the first bonding layer to define a bonding interface. At least one of the first wafer substrate and the second wafer substrate includes a crack-arresting film layer configured to increase a bonding energy of the bonding interface.
Public/Granted literature
- US20160141263A1 SEMICONDUCTOR DEVICE INCLUDING BUILT-IN CRACK-ARRESTING FILM STRUCTURE Public/Granted day:2016-05-19
Information query
IPC分类: