Invention Grant
US09536853B2 Semiconductor device including built-in crack-arresting film structure 有权
半导体器件包括内置的防裂膜结构

Semiconductor device including built-in crack-arresting film structure
Abstract:
According to at least one embodiment of the present invention, a wafer-to-wafer semiconductor device includes a first wafer substrate having a first bonding layer formed on a first bulk substrate layer. A second wafer substrate includes a second bonding layer formed on a second bulk substrate layer. The second bonding layer is bonded to the first bonding layer to define a bonding interface. At least one of the first wafer substrate and the second wafer substrate includes a crack-arresting film layer configured to increase a bonding energy of the bonding interface.
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