Invention Grant
- Patent Title: Self-cut sidewall image transfer process
- Patent Title (中): 自切割侧壁图像传输过程
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Application No.: US14525484Application Date: 2014-10-28
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Publication No.: US09536739B2Publication Date: 2017-01-03
- Inventor: Effendi Leobandung
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Ryan, Mason & Lewis, LLP
- Agent Louis J. Percello
- Main IPC: H01L21/311
- IPC: H01L21/311 ; H01L21/76 ; H01L21/033 ; H01L29/78 ; H01L21/8234 ; H01L21/308 ; G06F17/50 ; H01L21/3213
Abstract:
A plurality of mandrels is formed on a silicon substrate. The mandrels are spaced apart at a given pitch, wherein at least one of the plurality of mandrels is formed having a first width, and at least another one of the plurality of mandrels is formed having a second width, and wherein the first width is greater than the second width. At least one structure is formed by removing at least a portion of the plurality of mandrels in a sidewall image transfer process without using a cut mask.
Public/Granted literature
- US20160118263A1 SELF-CUT SIDEWALL IMAGE TRANSFER PROCESS Public/Granted day:2016-04-28
Information query
IPC分类:
