Invention Grant
US09536630B2 Method for removing radioactive cesium, hydrophilic resin composition for removal of radioactive cesium, method for removing radioactive iodine and radioactive cesium, and hydrophilic resin composition for removal of radioactive iodine and radioactive cesium
有权
去除放射性铯的方法,去除放射性铯的亲水性树脂组合物,放射性碘和放射性铯的除去方法以及用于除去放射性碘和放射性铯的亲水性树脂组合物
- Patent Title: Method for removing radioactive cesium, hydrophilic resin composition for removal of radioactive cesium, method for removing radioactive iodine and radioactive cesium, and hydrophilic resin composition for removal of radioactive iodine and radioactive cesium
- Patent Title (中): 去除放射性铯的方法,去除放射性铯的亲水性树脂组合物,放射性碘和放射性铯的除去方法以及用于除去放射性碘和放射性铯的亲水性树脂组合物
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Application No.: US14266102Application Date: 2014-04-30
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Publication No.: US09536630B2Publication Date: 2017-01-03
- Inventor: Kazuyuki Hanada , Manabu Uruno , Kazuya Kimura , Kenichi Takahashi
- Applicant: Dainichiseika Color & Chemicals Mfg. Co., Ltd. , Ukima Chemicals & Color Mfg. Co., Ltd.
- Applicant Address: JP Tokyo JP Tokyo
- Assignee: Dainichiseika Color & Chemicals Mfg. Co., Ltd.,Ukima Chemicals & Color Mfg. Co., Ltd.
- Current Assignee: Dainichiseika Color & Chemicals Mfg. Co., Ltd.,Ukima Chemicals & Color Mfg. Co., Ltd.
- Current Assignee Address: JP Tokyo JP Tokyo
- Agency: Burr & Brown, PLLC
- Priority: JP2011-288508 20111228; JP2012-011351 20120123; JP2012-055124 20120312; JP2012-068630 20120326
- Main IPC: G21F9/12
- IPC: G21F9/12 ; G21F9/16 ; G21F9/30

Abstract:
A method for removing radioactive cesium and/or iodine from a radioactive substance in liquid and/or a solid matter using a hydrophilic resin composition comprising a hydrophilic resin and a metal ferrocyanide compound, wherein the hydrophilic resin includes at least one hydrophilic resin selected from the group consisting of a hydrophilic polyurethane resin, a hydrophilic polyurea resin, and a hydrophilic polyurethane-polyurea resin each having at least a hydrophilic segment, and a metal ferrocyanide compound is dispersed in the hydrophilic resin composition in a ratio of at least 1 to 200 mass parts relative to 100 mass parts of the hydrophilic resin.
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