Invention Grant
- Patent Title: 3D memory structure and method for manufacturing the same
- Patent Title (中): 3D内存结构及其制造方法
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Application No.: US14645446Application Date: 2015-03-12
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Publication No.: US09536573B2Publication Date: 2017-01-03
- Inventor: Chih-Wei Hu , Teng-Hao Yeh
- Applicant: MACRONIX INTERNATIONAL CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: MACRONIX INTERNATIONAL CO., LTD.
- Current Assignee: MACRONIX INTERNATIONAL CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: McClure, Qualey & Rodack, LLP
- Main IPC: H01L29/49
- IPC: H01L29/49 ; G11C5/06 ; G11C8/10 ; H01L23/528 ; H01L21/768 ; H01L27/115

Abstract:
A 3D memory structure and a method for manufactured the same are provided. The 3D memory structure comprises a plurality of strings, a plurality of first conductive lines, a plurality of second conductive lines and a plurality of third conductive lines. The strings are disposed in parallel. The first conductive lines are disposed over the strings. Center regions of the first conductive lines are disposed perpendicular to the strings. The second conductive lines are disposed over the first conductive lines. The second conductive lines connect end regions of half of the first conductive lines. The third conductive lines are disposed over the second conductive lines. The third conductive lines connect end regions of the other half of the first conductive lines.
Public/Granted literature
- US20160267947A1 3D MEMORY STRUCTURE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2016-09-15
Information query
IPC分类: