Invention Grant
- Patent Title: Imaging optics, microlithography projection exposure apparatus having same and related methods
- Patent Title (中): 成像光学,具有相同方法的微光刻投影曝光装置
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Application No.: US14662514Application Date: 2015-03-19
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Publication No.: US09535337B2Publication Date: 2017-01-03
- Inventor: Hans-Juergen Mann , David R. Shafer
- Applicant: Carl Zeiss SMT GmbH
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03B27/42 ; G03F7/20 ; G02B17/06

Abstract:
An imaging optics has a plurality of mirrors to image an object field in an object plane into an image field in an image plane. The imaging optics includes a first partial objective to image the object field onto an intermediate image, and the imaging optics includes a second partial objective to image the intermediate image onto the image field. The second partial objective includes a penultimate mirror in the beam path of imaging light between the object field and the image field, and the second partial objective includes a last mirror in the beam path. The penultimate mirror images the intermediate image onto a further intermediate image, and the last mirror images the further intermediate image onto the image field.
Public/Granted literature
- US20150219999A1 IMAGING OPTICS, MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS HAVING SAME AND RELATED METHODS Public/Granted day:2015-08-06
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