Invention Grant
US09535337B2 Imaging optics, microlithography projection exposure apparatus having same and related methods 有权
成像光学,具有相同方法的微光刻投影曝光装置

Imaging optics, microlithography projection exposure apparatus having same and related methods
Abstract:
An imaging optics has a plurality of mirrors to image an object field in an object plane into an image field in an image plane. The imaging optics includes a first partial objective to image the object field onto an intermediate image, and the imaging optics includes a second partial objective to image the intermediate image onto the image field. The second partial objective includes a penultimate mirror in the beam path of imaging light between the object field and the image field, and the second partial objective includes a last mirror in the beam path. The penultimate mirror images the intermediate image onto a further intermediate image, and the last mirror images the further intermediate image onto the image field.
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