Invention Grant
- Patent Title: Inspection system
- Patent Title (中): 检验系统
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Application No.: US14401455Application Date: 2013-04-01
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Publication No.: US09535009B2Publication Date: 2017-01-03
- Inventor: Kenshiro Ohtsubo , Hidetoshi Nishiyama , Takahiro Jingu , Masaaki Ito
- Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Applicant Address: JP Tokyo
- Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Current Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2012-112061 20120516
- International Application: PCT/JP2013/059817 WO 20130401
- International Announcement: WO2013/172103 WO 20131121
- Main IPC: G01N21/84
- IPC: G01N21/84 ; G01N21/88 ; G01N21/95 ; G01N21/956

Abstract:
To improve sensitivity of a defect inspection, it is required to decrease influence of excessive diffraction from a spatial filter. Further, it is preferable to secure signal intensity from defects and particles as much as possible, while the influence of the excessive diffraction is decreased as much as possible. The present invention is characterized in setting a width of a spatial filter surface such that an unnecessary image caused by diffraction, that is, an intensity of the excessive diffraction is sufficiently small with respect to an intensity of a desired image. In the present invention, an SN ratio that is an index for deciding a width of the spatial filter is calculated from a region subjected to the influence of the excessive diffraction in an inspection image, and a width of a shield unit of the spatial filter is set so as to maximize the SN ratio.
Public/Granted literature
- US20150131087A1 INSPECTION SYSTEM Public/Granted day:2015-05-14
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