Invention Grant
- Patent Title: Measuring module for remission photometric analysis and method for the production thereof
- Patent Title (中): 用于缓解光度分析的测量模块及其生产方法
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Application No.: US14426590Application Date: 2013-09-05
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Publication No.: US09534951B2Publication Date: 2017-01-03
- Inventor: Jan Buchwald , Susanne Gaumitz , Stefan Kalveram , Sebastian Trick
- Applicant: JENOPTIK Polymer Systems GmbH , Roche Diagnostics Operations, Inc.
- Applicant Address: DE Triptis US IN Indianapolis
- Assignee: Jenoptik Polymer Systems GmbH,Roche Diagnostics Operations, Inc.
- Current Assignee: Jenoptik Polymer Systems GmbH,Roche Diagnostics Operations, Inc.
- Current Assignee Address: DE Triptis US IN Indianapolis
- Agency: Muncy, Geissler, Olds & Lowe, P.C.
- Priority: DE102012018015 20120906
- International Application: PCT/EP2013/002667 WO 20130905
- International Announcement: WO2014/037112 WO 20140313
- Main IPC: H01L25/16
- IPC: H01L25/16 ; G01J1/04 ; G01N21/47 ; G02B5/20 ; H01L31/167 ; C23C14/22 ; G01J1/42
Abstract:
A measuring module for remission photometric analysis of one or a plurality of specimens is provided with the following features: a transmitter with a transmission channel for transmitting a measuring radiation to location of the specimen; a first focusing device for focusing the measuring radiation on the specimen; a receiver with a receiving channel to receive the radiation reflected by the specimen; a second focusing device made of plastic for focusing the measuring radiation reflected by the specimen onto the receiver, whereby the second focusing device further comprises a filter which is designed to filter a fluorescence radiation from the specimen excited by the measuring radiation.
Public/Granted literature
- US20150241268A1 MEASURING MODULE FOR REMISSION PHOTOMETRIC ANALYSIS AND METHOD FOR THE PRODUCTION THEREOF Public/Granted day:2015-08-27
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