Invention Grant
- Patent Title: Detection apparatus, measurement apparatus, exposure apparatus, method of manufacturing article, and measurement method
- Patent Title (中): 检测装置,测量装置,曝光装置,制品的制造方法和测量方法
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Application No.: US14840400Application Date: 2015-08-31
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Publication No.: US09534888B2Publication Date: 2017-01-03
- Inventor: Akio Akamatsu
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JP2014-181599 20140905
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/52 ; G01B11/27 ; G03F9/00

Abstract:
The present invention provides a detection apparatus which detects an original mark on an original and a substrate mark on a substrate, the original mark and the substrate mark being arranged via a projection optical system, the apparatus comprising an optical system including an imaging device and configured to form an image of the original mark and an image of the substrate mark onto the imaging device, wherein the optical system includes a detection reference member having a first mark and a second mark, and is configured to form an image of the first mark onto the original, form an image of the second mark onto the substrate via the projection optical system and the original, and form the image of the first mark, and the image of the second mark onto the imaging device.
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