Invention Grant
- Patent Title: Cleaning method for thin-film processing applications and apparatus for use therein
- Patent Title (中): 薄膜加工用的清洗方法及其用途
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Application No.: US13965968Application Date: 2013-08-13
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Publication No.: US09534294B2Publication Date: 2017-01-03
- Inventor: Florian Ries , Stefan Hein , Stefan Lorenz , Neil Morrison , Tobias Stolley
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan, LLP
- Priority: EP13176899 20130717
- Main IPC: C25F1/00
- IPC: C25F1/00 ; C23C16/44 ; H01J37/32
Abstract:
According to the present disclosure, a method for cleaning the processing chamber of a flexible substrate processing apparatus without breaking the vacuum in the processing chamber is provided. The method for cleaning the processing chamber includes guiding a sacrificial foil into the processing chamber; initiating a first pump process in the processing chamber; plasma cleaning the processing chamber while the sacrificial foil is provided in the processing chamber; initiating a second pump process in the processing chamber; and guiding a flexible substrate into the processing chamber.
Public/Granted literature
- US20150020847A1 CLEANING METHOD FOR THIN-FILM PROCESSING APPLICATIONS AND APPARATUS FOR USE THEREIN Public/Granted day:2015-01-22
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