Invention Grant
- Patent Title: Passive injection of a chemical solution into a process stream
- Patent Title (中): 将化学溶液无源注入工艺流
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Application No.: US14298191Application Date: 2014-06-06
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Publication No.: US09533270B2Publication Date: 2017-01-03
- Inventor: Robert James Law , Robert L Cowan , Thomas P Diaz , Samson Hettiarachchi
- Applicant: Robert James Law , Robert L Cowan , Thomas P Diaz , Samson Hettiarachchi
- Main IPC: B01F15/04
- IPC: B01F15/04 ; B01F5/04 ; G05D11/00 ; F16K11/00

Abstract:
A system and method of injecting a chemical into a high pressure process stream without pumps or other active components. The system utilizes the differential pressure created by resistive losses of downstream components within a high pressure process stream. A bypass side stream is taken from an upstream pressure location and returned to the downstream side of the resistive inline process component. The chemical solution vessel is pressurized by the higher side of the pressure differential. The solution then passes through a flow controlling capillary tube exiting on the lower pressure differential side into the bypass stream. The high flow rate chemically diluted bypass stream then returns to the process stream at the lower differential process stream tie-in. The chemical solution is isolated from the process water pressuring the vessel by a movable separating device preventing mixing of the two fluids. The vessel can also be pressurized by gas.
Public/Granted literature
- US20140360606A1 Passive Injection of a Chemical Solution into a Process Stream Public/Granted day:2014-12-11
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