Invention Grant
- Patent Title: Method and apparatus for supplying mixed gas
- Patent Title (中): 供应混合气体的方法和装置
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Application No.: US14511214Application Date: 2014-10-10
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Publication No.: US09533268B2Publication Date: 2017-01-03
- Inventor: Kunihiko Koike , Yu Yoshino , Naohisa Makihira , Takehiko Senoo , Toshihiro Aida , Tomoya Biro , Hiroshi Ichimaru , Masahiro Tainaka
- Applicant: Iwatani Corporation , CENTRAL GLASS COMPANY, LIMITED
- Applicant Address: JP Osaka JP Yamaguchi
- Assignee: IWATANI CORPORATION,CENTRAL GLASS COMPANY, LIMITED
- Current Assignee: IWATANI CORPORATION,CENTRAL GLASS COMPANY, LIMITED
- Current Assignee Address: JP Osaka JP Yamaguchi
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP2012-091508 20120413
- Main IPC: B01F5/10
- IPC: B01F5/10 ; G05D11/13 ; G05D11/00 ; B01F15/00 ; B01F15/02

Abstract:
A method and apparatus, for supplying high-pressure mixed gas of a low-vapor-pressure first gas as an active gas and a high-vapor-pressure second gas, are arranged to reduce an amount of the first gas discarded. The mixed gas in a high-pressure state is supplied from a mixing container to a use point. Upon reduction of pressure in the mixing container to a setpoint as a result of supply to the use point, a predetermined amount of the first gas is charged into a replenishment container connected to the mixing container by a replenishment line having a replenishment valve, and which is evacuated. As the second gas is charged into the replenishment container charged with the first gas, the replenishment valve is opened such that the first gas in the replenishment container is forced out by the second gas, thereby charging the mixing container with the mixed gas in the high-pressure condition.
Public/Granted literature
- US20150020890A1 METHOD AND APPARATUS FOR SUPPLYING MIXED GAS Public/Granted day:2015-01-22
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