Invention Grant
US09437693B2 Device having a shield plate dopant region and method of manufacturing same
有权
具有屏蔽板掺杂剂区域的器件及其制造方法
- Patent Title: Device having a shield plate dopant region and method of manufacturing same
- Patent Title (中): 具有屏蔽板掺杂剂区域的器件及其制造方法
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Application No.: US14572773Application Date: 2014-12-17
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Publication No.: US09437693B2Publication Date: 2016-09-06
- Inventor: Zihao M. Gao , David C. Burdeaux , Agni Mitra
- Applicant: Zihao M. Gao , David C. Burdeaux , Agni Mitra
- Applicant Address: US TX Austin
- Assignee: FREESCALE SEMICONDUCTOR, INC.
- Current Assignee: FREESCALE SEMICONDUCTOR, INC.
- Current Assignee Address: US TX Austin
- Main IPC: H01L29/76
- IPC: H01L29/76 ; H01L29/40 ; H01L29/78 ; H01L29/66

Abstract:
A transistor includes a surface region, a gate, a source dopant region, a drain dopant region, a drift dopant region, a set of electrically conductive shield plates, and a shield plate dopant region. A sidewall of the gate aligns with a drain side boundary of the surface region. The drain dopant region is within the surface region on the drain side. The drift dopant region is within the surface region between the drain side boundary and the drain dopant region. The set of electrically conductive shield plates includes a first shield plate overlying the drift dopant region. The shield plate dopant region is within the drift dopant region and underlies the set of shield plates.
Public/Granted literature
- US20160181378A1 DEVICE HAVING A SHIELD PLATE DOPANT REGION AND METHOD OF MANUFACTURING SAME Public/Granted day:2016-06-23
Information query
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