A pixel structure includes a thin film transistor device. The thin film transistor device includes a first connection electrode, a second connection electrode, an oxide semiconductor channel layer, a gate insulation layer, a gate electrode, a dielectric layer, a source electrode and a drain electrode. The oxide semiconductor channel layer at least partially covers a top surface of the first connection electrode and a top surface of the second connection electrode. The gate electrode is disposed on the gate insulation layer. The dielectric layer is disposed on the gate electrode and the gate insulation layer. The gate insulation layer and the dielectric layer have a first contact hole at least partially exposing the top surface of the first connection electrode and a second contact hole at least partially exposing the top surface of the second connection electrode. The source electrode is electrically connected to the first connection electrode via the first contact hole, and the drain electrode is electrically connected to the second connection electrode via the second contact hole.