Invention Grant
- Patent Title: Substrate processing apparatus with a cleaning processing section for cleaning a chemical liquid processing section
- Patent Title (中): 具有清洗处理部的基板处理装置，用于清洗药液处理部
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Application No.: US14322982Application Date: 2014-07-03
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Publication No.: US09436087B2Publication Date: 2016-09-06
- Inventor: Kazuo Morioka , Masanori Imamura , Satoshi Yamamoto , Hideki Shimizu
- Applicant: DAINIPPON SCREEN MFG. CO., LTD. , SOKUDO CO., LTD.
- Applicant Address: JP JP
- Assignee: SCREEN Holdings Co., Ltd.,SCREEN Semiconductor Solutions Co., Ltd.
- Current Assignee: SCREEN Holdings Co., Ltd.,SCREEN Semiconductor Solutions Co., Ltd.
- Current Assignee Address: JP JP
- Agency: Ostrolenk Faber LLP
- Priority: JP2013-145514 20130711
- Main IPC: B08B3/08
- IPC: B08B3/08 ; B08B3/04 ; B05B15/00 ; H01L21/67 ; B05C11/10 ; G03F7/16 ; B05B15/02 ; B08B9/02 ; G03F7/42
Abstract:
Each chemical processing section includes a chemical liquid bottle, a buffer tank, a pump, a filter, a discharge valve and a discharge nozzle. A chemical liquid stored in the chemical liquid bottle is led to the discharge nozzle and is discharged from the discharge nozzle to a substrate. A cleaning processing section includes a solvent bottle, a cleaning liquid bottle, the buffer tank and the pump. A solvent stored in the solvent bottle, a cleaning liquid stored in the cleaning liquid bottle and a gas supplied from a gas supply source are selectively led to the discharge nozzle in each chemical liquid processing section.
Public/Granted literature
- US20150013603A1 SUBSTRATE PROCESSING APPARATUS Public/Granted day:2015-01-15
Information query
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